We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for X-ray photoelectron spectrometer.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

X-ray photoelectron spectrometer Product List and Ranking from 6 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 03, 2025～Sep 30, 2025
This ranking is based on the number of page views on our site.

X-ray photoelectron spectrometer Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 03, 2025～Sep 30, 2025
This ranking is based on the number of page views on our site.

  1. サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K. Tokyo//Testing, Analysis and Measurement
  2. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  3. シエンタ オミクロン Tokyo//Testing, Analysis and Measurement
  4. 4 大同分析リサーチ Aichi//Service Industry
  5. 5 カネカテクノリサーチ 本社、東京営業所、名古屋営業所、大阪分析センター、高砂分析センター Osaka//Testing, Analysis and Measurement
Go to Company Ranking

X-ray photoelectron spectrometer Product ranking

Last Updated： Aggregation Period:Sep 03, 2025～Sep 30, 2025
This ranking is based on the number of page views on our site.

  1. X-ray photoelectron spectroscopy device 'Nexsa' サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K.
  2. Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha' サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K.
  3. [XPS] X-ray Photoelectron Spectroscopy 一般財団法人材料科学技術振興財団　MST
  4. HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System) シエンタ オミクロン
  5. 4 [Analysis Case] Evaluation of Composition and Bonding State of GaN Film by XPS 一般財団法人材料科学技術振興財団　MST

X-ray photoelectron spectrometer Product List

1～15 item / All 15 items

Displayed results
Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha'

Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha'

Capable of meeting various needs! Introducing an XPS device that achieves excellent operability and high-sensitivity measurements.

The K-Alpha is a fully automated X-ray photoelectron spectroscopy device that achieves the highest level of operability and unparalleled performance simultaneously through the adoption of new technology. Equipped with a low-power, high-intensity X-ray monochromator, it allows for the selection of analysis areas in 5μm steps from 50μm to 400μm. By adjusting the analysis area to the desired sample size, it is possible to obtain the highest level of signal intensity. 【Features】 ■ High sensitivity, high energy resolution XPS measurements ■ Micro-focus X-ray source for micro-area analysis ■ Real-time sample observation mechanism from the vertical direction of the sample ■ Excellent operability and high throughput ■ Integrated control of measurement, analysis, and device control through the Thermo Scientific Avantage data system *For more details, please refer to the PDF document or feel free to contact us.

  • 2020-02-06_10h40_52.png
  • 2020-02-06_10h41_16.png
  • 2020-02-06_10h41_29.png
  • 2020-02-06_10h41_43.png
  • 2020-02-06_10h47_57.png
  • 2020-02-06_10h47_24.png
  • Spectroscopic Analysis Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
X-ray photoelectron spectroscopy device 'Nexsa'

X-ray photoelectron spectroscopy device 'Nexsa'

Achieving micro-scale and multifunctional analysis! X-ray photoelectron spectroscopy device capable of equipping multifunctional options.

"Nexsa" is an X-ray photoelectron spectroscopy device that achieves both the highest level of performance and complete automation of measurements. The new monochromator X-ray source can measure from 10 to 400 μm in 5 μm steps while maintaining high sensitivity. The combination of a high-efficiency lens system and detector enables high-sensitivity, high-speed XPS analysis. 【Features】 ■ Capable of measuring low-concentration compounds and microscopic areas ■ Achieves both the highest level of performance and complete automation of measurements ■ Multi-functional options can be equipped ■ Realizes high-sensitivity, high-speed XPS analysis ■ Makes it easy to measure insulators *For more details, please refer to the PDF document or feel free to contact us.

  • 2020-02-06_10h43_23.png
  • 2020-02-06_10h44_52.png
  • 2020-02-06_10h45_12.png
  • 2020-02-06_10h45_38.png
  • 2020-02-06_10h46_05.png
  • Spectroscopic Analysis Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[XPS] X-ray Photoelectron Spectroscopy

[XPS] X-ray Photoelectron Spectroscopy

Effective for evaluating the types, quantities, and chemical bonding states of elements on the sample surface (at a depth of about several nanometers).

XPS is a technique that measures the kinetic energy distribution of photoelectrons emitted by X-ray irradiation, providing insights into the types, quantities, and chemical bonding states of elements present on the sample surface (to a depth of about a few nanometers). Because it can provide information about chemical bonding states, it is also known as ESCA: Electron Spectroscopy for Chemical Analysis. - Qualitative and quantitative analysis of elements on solid surfaces (approximately 2 to 8 nm) is possible. - Chemical bonding state analysis is possible. - Non-destructive analysis is possible. - Measurement of depth distribution (using ion sputtering) is possible. - Measurement of insulators is possible. - Measurement under controlled atmospheres is possible.

  • 打ち合わせ.jpg
  • セミナー.jpg
  • Contract Analysis
  • Contract measurement
  • Contract Inspection

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[Analysis Case] Evaluation of Composition and Bonding State of GaN Film by XPS

[Analysis Case] Evaluation of Composition and Bonding State of GaN Film by XPS

Evaluation will be conducted under measurement conditions tailored to the purpose.

This text introduces an example of evaluating the composition and bonding states of GaN films used in LEDs and power devices using XPS. Understanding how the composition and bonding states change due to film formation conditions and surface treatments is effective for process management. It is important to appropriately select the X-rays used during the evaluation according to the purpose. Measurement conditions for each focus will also be presented.

  • Contract Analysis

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System)

HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System)

Hard X-ray photoelectron spectroscopy, which was only possible at synchrotron facilities, is now available for use in laboratories!

This is a next-generation XPS device that can analyze depths that conventional XPS has not been able to reach until now. It has become possible to use hard X-rays, which were previously only available at synchrotron facilities. High-resolution hard X-ray photoelectron spectroscopy has been achieved using a Ga Kα monochromatic X-ray source with 9.25 keV excitation. 【Applications】 XPS observation and measurement of samples in areas deeper than the surface. --- Below is an introduction in English. HAXPES-Lab is designed to allow hard X-ray photoelectron spectroscopy (HAXPES) measurements in standard lab environments. The instrument offers the unique possibility to investigate bulk properties of various materials, analyze buried interfaces, and access deep core levels. *For more details, please contact us.

  • Analytical Equipment and Devices

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
The influence of adsorbed oxygen in XPS.

The influence of adsorbed oxygen in XPS.

XPS: X-ray Photoelectron Spectroscopy

XPS is a method for obtaining information about the composition and bonding state of the sample surface (to a depth of about several nanometers), but by combining it with ion irradiation for sputter etching, it is also possible to evaluate the internal structure of the sample and depth distribution. However, in evaluations involving sputter etching, due to the principles and measurement mechanisms of XPS, the amount of oxygen may be overestimated due to the influence of adsorbed oxygen, so caution is required. In the case of evaluating samples that easily adsorb oxygen (such as Ti, TiN, AlN, etc.) or focusing on trace amounts of oxygen, the influence of adsorbed oxygen becomes significant, so comparisons between samples and analyses using SIMS are recommended.

  • Contract Analysis

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[Analysis Case] Verification of Reduction Treatment for Sn Oxide

[Analysis Case] Verification of Reduction Treatment for Sn Oxide

Comparison of XPS and computational simulations: Analysis of electronic states from the valence band spectrum.

XPS is a method for evaluating the composition and bonding state of a material based on the photoelectron spectrum from inner shell levels. On the other hand, the valence band spectrum, which reflects the states of the outer shell electrons, appears near the Fermi level. This document presents a case study that verifies the reduction treatment of Sn oxides by comparing and discussing the density of states calculated through first-principles calculations with the valence band spectrum obtained by XPS. Utilizing computational simulations allows for a deeper understanding of the XPS spectrum obtained.

  • Contract Analysis

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[Analysis Case] Analysis of Surface Functional Groups of Polymer Materials (Chemical Modification - XPS)

[Analysis Case] Analysis of Surface Functional Groups of Polymer Materials (Chemical Modification - XPS)

This paper presents a case where a specific functional group was chemically modified using a reagent containing heteroatoms, and the ratio of surface functional groups derived from the introduced heteroatoms was evaluated.

【Analysis Sample】4,4'-Diaminodiphenyl Ether (DADPE), OH-terminated Si wafer 【Analysis Method】XPS; monochromatic AlKα radiation (ULVAC-PHI model PHI5000 VersaProbe II) 【Analysis Results】 1. Evaluation of Amino Groups Focusing on the heteroatom F, the analysis revealed that the proportion of amino groups relative to the carbon from the sample was 19 at%. 2. Evaluation of Silanol Groups Focusing on the heteroatom F, the analysis revealed that the proportion of silanol groups relative to the silicon from the sample was 3 at%. 【Summary】 XPS analysis of chemically modified samples allows for the determination of the proportion of surface functional groups. Additionally, by analyzing the surfaces of samples with different material properties and comparing the proportions of surface functional groups, it is also possible to evaluate the impact of surface functional groups on material properties.

  • Contract measurement

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Application examples of total reflection HAXPES

Application examples of total reflection HAXPES

Under the condition of total reflection, the penetration depth of X-rays is shorter than the escape depth of photoelectrons, so the detection depth of HAXPES is determined by the penetration depth of the X-rays!

Hard X-ray photoelectron spectroscopy (HAXPES) has made significant progress by enabling bulk-sensitive measurements in the hard X-ray region, whereas measurements in the soft X-ray region had been mainstream until now. On the other hand, HAXPES measurements under total reflection conditions of X-rays are also being conducted for the purpose of analyzing surface states. Under total reflection conditions, X-rays are incident at the critical angle for total reflection, which limits the depth of penetration into the material. Applying this characteristic to HAXPES allows for the analysis of bonding states of interfacial oxide layers and segregated impurities at the atomic layer level. *For more detailed information, please refer to the attached PDF document. Feel free to contact us for further inquiries.

  • Other analysis and evaluation services

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
X-ray photoelectron spectroscopy (XPS)

X-ray photoelectron spectroscopy (XPS)

By measuring the energy and intensity of photoelectrons, it is possible to identify and quantify atoms!

"X-ray photoelectron spectroscopy (XPS)" is a surface analysis technique that allows for the compositional analysis of ultra-thin surfaces at the nanometer level. It is also capable of evaluating the electronic states (chemical bonding, valence, hybridization, electron correlation) of each element that makes up the material, and by using a neutralization gun, it can measure the surfaces of insulators as well, making it widely used for the analysis of various material surfaces. Please feel free to contact us when you need assistance. 【Features】 ■ Compositional analysis of the topmost surface at the nanometer level (Li and above) is possible ■ Sensitivity is approximately 0.1 atomic% ■ Electronic state analysis (chemical bonding, valence, gap, etc.) is possible ■ Measurement of insulators and organic materials is possible (non-destructive analysis) ■ Measurement area ranges from several tens to several hundred µm in diameter * For more details, please download the PDF or feel free to contact us.

  • Contract Analysis

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
X-ray photoelectron spectroscopy (XPS)

X-ray photoelectron spectroscopy (XPS)

We support your material evaluation by assessing the outermost surface of the material using XPS (X-ray photoelectron spectroscopy).

X-ray photoelectron spectroscopy (XPS) is an essential tool in the development and quality control across various fields. Please utilize XPS for improving the performance of your products, investigating the causes of defects, and developing next-generation materials. XPS can clarify the following information by irradiating the sample's outer surface (a few nm) with X-rays and precisely analyzing the energy of the emitted photoelectrons: (1) Identification of constituent elements: A wide range of elements can be analyzed, from lithium (Li) to uranium (U). (2) Depth profiling: By combining with argon sputtering, it is possible to evaluate the elemental composition in the depth direction from the surface. This is effective for assessing film thickness and interface analysis. (3) Atmosphere-free analysis: Using special equipment, samples can be analyzed without exposure to the atmosphere. This prevents surface contamination or alteration due to atmospheric components, allowing for the acquisition of true surface information. (4) Measurement of insulators: Analysis of a wide variety of materials is possible.

  • Contract Analysis

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Hard X-ray Photoelectron Spectroscopy

Hard X-ray Photoelectron Spectroscopy

HAXPES is an analytical method that uses hard X-rays as the excitation light for XPS (X-ray photoelectron spectroscopy).

It is also referred to as HX-PES or HXPES. Due to high-energy X-ray excitation, it allows for bulk state evaluation up to approximately 50 nm deep, which is several to about 10 times deeper than conventional XPS, as well as damage-free evaluation of bonding states at interfaces. This device is a laboratory instrument equipped with a GaKα source (9.25 keV), which enables a reduction in the time lag from sample preparation to measurement. - Bulk-sensitive state evaluation (approximately up to 50 nm) - Non-destructive evaluation of buried interface bonding states - Evaluation using deep inner shell orbitals (avoiding overlapping Auger peaks in XPS, analysis using the non-split 1s orbital) It also includes options for measurements combined with sputtering using GCIB (Gas Cluster Ion Beam), angle-resolved measurements, Al source (1.49 keV), neutralization guns, and measurements under non-exposure to the atmosphere. - Damage-free sputter cleaning using GCIB (depth profiling is generally not possible) - Depth-direction comparison of bonding states using Al source and angle-resolved measurements - Evaluation under non-exposure to the atmosphere

  • Contract measurement

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
[Analysis Case] Chemical State Analysis of Metal Elements on the Sample Surface Due to Heating

[Analysis Case] Chemical State Analysis of Metal Elements on the Sample Surface Due to Heating

This is an example of evaluating the changes in the chemical state of metal elements due to heating two types of metal foils within an XPS device.

**Analysis Samples** (1) Cu Foil: The Cu foil, which was discolored by heating in the atmosphere, was used for analysis. (2) Ag Foil: The Ag foil, which was discolored due to atmospheric corrosion, was used for analysis. **Analysis Method** XPS Analysis XPS; monochromatic AlKα radiation (ULVAC-PHI model PHI5000 VersaProbe II) Each sample was measured at room temperature and then heated to 500°C in the device (under vacuum) and measured again after heating. **Summary** By conducting XPS analysis, it is possible to evaluate the changes in chemical state associated with the temperature rise of the samples under vacuum. Additionally, the X-ray photoelectron spectroscopy (XPS) equipment owned by Kaneka Techno Research can perform XPS measurements both before and after heating, as well as during heating. Therefore, if the reaction rate is slow, it is also possible to evaluate how the chemical state changes over time.

  • Contract measurement

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Application of XPS analysis to tablets

Application of XPS analysis to tablets

You can obtain information about the chemical composition, bonding state, and valence of the outermost surface!

We would like to introduce the application of XPS analysis to tablets. X-ray photoelectron spectroscopy (XPS) is an analytical method that observes electrons emitted when X-rays are irradiated onto a sample, allowing us to extract information about the electrons present within the sample. This technique provides information on the chemical composition, bonding states, and valence of the surface. Please feel free to contact us if you have any inquiries. 【Features】 ■ Composition analysis of the topmost surface at a few nm (Li～) is possible ■ Sensitivity is approximately 0.1 atomic% ■ Electronic state analysis (chemical bonding, valence, gap, etc.) is possible ■ Measurement of insulators and organic materials is possible (non-destructive analysis) ■ Measurement area ranges from several tens to several hundred μm in diameter *For more details, please download the PDF or feel free to contact us.

  • Other analysis and evaluation services

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
XPS analysis of discolored copper material surface

XPS analysis of discolored copper material surface

In the investigation of the discoloration of metal components, qualitative analysis of the surface condition and evaluation using XPS of the thickness and depth distribution of the surface oxide film are very effective!

We would like to introduce the XPS analysis of the discolored copper material surface. The causes of copper discoloration can be due to the formation of corrosion products, as well as differences in the thickness of the surface oxide film (resulting in color changes due to light interference phenomena). Therefore, in addition to qualitative analysis of the very surface using X-ray photoelectron spectroscopy (XPS), conducting depth profile analysis is also effective. In the attached PDF document, we present a case study where qualitative surface analysis and depth profile analysis of the copper material were conducted, comparing the discolored areas with the normal areas. Please take a look. [Evaluation of Copper Surface Discoloration] ■ Conducting depth profile analysis in addition to qualitative analysis of the very surface using X-ray photoelectron spectroscopy (XPS) is effective. *For more details, please download the PDF or feel free to contact us.

  • Other analysis and evaluation services

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.